What is a sputtering target?

1. Sputtering target material

Sputtering target material is through the magnetron sputtering technology, multi-arc ion coating or other kinds of coating technology and then use certain technological conditions, and then through deposition, on the base material will form a film with special functions, the initial material is called the sputtering target material. Its composition materials mainly include a variety of pure metals, alloys and inorganic non-metallic materials (ceramics), the common geometric form is round sheet and rectangular plate.

2, sputtering target material classification

(1) Classification by shape

Sputtering target material can be divided into long target, square target, round target and tube target according to its shape.

(2) Classification by chemical composition

Sputtering targets can be divided into metal targets (pure metal aluminum, titanium, copper, tantalum, etc.), alloy targets (molybdenum niobium alloy, molybdenum titanium alloy, molybdenum tantalum alloy, nickel chromium alloy, nickel cobalt alloy, etc.), ceramic compound targets (ITO and other oxides, silicides, carbide, sulfide, etc.).

(3) Classification by application field

Sputtering target can be divided into semiconductor chip target, planar display target, solar cell target, information storage target, tool modification target, electronic device target and other target according to the application field.

3. Application field of sputtering target material

(1) semiconductor chip

The main materials involved: ultra-high purity aluminum, titanium, copper, tantalum, etc

Main Applications: Preparation of key raw materials for integrated circuits

Performance requirements: The highest technical requirements, ultra-high purity metal, high precision size, high integration

(2) Flat display

Main materials: high purity aluminum, copper, molybdenum, tin-doped indium oxide (ITO)

Main Applications: high definition TV, laptop, etc

Performance requirements: high technical requirements, high purity material, large material area, high uniformity

(3) Solar cells

Mainly involved in materials: high purity aluminum, copper, molybdenum, chromium, ITO

Main application: thin film solar cell

Performance requirements: High technical requirements and wide application range

(4) Information storage

Mainly related to materials: chromium base, cobalt base alloy, etc

Main applications: Optical drive, CD, etc

Performance requirements: High storage density, high transmission speed

(5) Tool modification

Mainly related to materials: pure metal chromium, chromium aluminum alloy, etc

Main applications: tools, molds and other surface strengthening

Performance requirements: High performance requirements and long service life

(6) Electronic devices

Mainly related to materials: nickel chromium alloy, chromium silicon alloy, etc

Main applications: film resistor, film capacitor

Performance requirements: Requirements of electronic devices small size, good stability, resistance temperature coefficient is small

(7) Other fields

Mainly involved in materials: pure metal chromium, titanium, nickel, etc

Main applications: decorative coating, glass coating, etc

Performance requirements: general technical requirements, mainly used for decoration, energy saving and so on