Factory sputtering titanium target for pvd coating machine
Product name | Customized Titanium Sputtering Targets |
Grade | Titanium (Gr1, Gr2, Gr5, Gr7,GR12) Alloy target: Ti-Al, Ti-Cr, Ti-Zr etc |
Proportion(wt%) | 5-80 ± 0.2Ti at your request. |
Titanium content | ≥99.5 (%) |
Density | 4.51g/cm3 |
Size | 1. Round target: Ø30--2000mm, thickness 3.0mm--300mm; 2. Plate Targe: Length: 200-500mm Width:100-230mm Thickness:3--40mm 3. Tube target: Dia:30-200mm Thickness:5-20mm Length:500-2000mm 4. Customized is available |
Technique | Forged and CNC Machined |
Application | Semiconductor separation, Film coating materials, Storage Electrode coating, Sputtering coating, Surface coating, Glass coating industry. |
Titanium Sputtering Targets
The common size of the titanium sputter target :Φ100*40, Φ98*40,Φ95*45,Φ90*40, Φ85*35, Φ65*40 etc.
Also can customize according to customer' requests or drawings
Titanium target Features:
1. Low Density and High Specification Strength
2. Excellent Corrosion Resistance
3. Good Resistance to Effect of Heat
4. Excellent Bearing to Cryogenics Property
5. Nonmagnetic and Non-toxic
6. Good Thermal Properties
7. Low Modulus of Elasticity
