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99.99%Tantalum target

99.99%Tantalum target

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Product introduction:

Tantalum target


Tantalum has a melting point of 2996℃, a boiling point of 5458℃ and a density of 16.6 g/cm. Tantalum is widely used in electronics, semiconductor, chemical industry, machinery, aerospace, medical treatment, military industry and other industries due to its high temperature resistance, corrosion resistance, good cold processing and welding performance. With the continuous progress and innovation of science and technology, tantalum will be more and more widely used in various fields.


Tantalum targets are mainly used in semiconductor, optical coating and other fields, our company can produce various specifications of semiconductor and optical tantalum and its alloy targets according to the different needs of customers. Ensure that the chemical composition of tantalum target material tantalum content is greater than 99.95%, 99.99%; Grain size less than 100um; Flatness less than 0.2mm; The surface roughness is less than Ra 1.6μm to ensure a high quality level of tantalum target.



Tantalum ingots smelted by vacuum electron beam melting furnace in our factory can be further processed into products required by customers through our subsequent forging press, milling machine, surface treatment equipment, vacuum annealing furnace, rolling mill, cutting machine, sawing machine, grinding machine, wire drawing machine and other processing equipment, including target material, sheet material, sheet material, strip material, bar material, silk material, pipe material and so on. According to customer's custom requirements and drawings for processing, welcome customers to inquire and customize!




Purity: 99.95% (3N5) -99.99% (4N)


Brand name: RO5200,


Specification: square target, round target, rotating target


Implementation standard: ASTM B708


Recrystallization rate: At least 95%


Grain size: conventional grain size < 100um, can be customized grain size according to customer requirements


Flatness ≤0.2mm


Surface roughness lt; 1.6 mu m


Metal impurities, ppm


elementAlAgAuBBiCaCdClCoCrCuFe
content0.21.01.00.11.00.11.01.00.050.250.750.4
elementGaGeHfKLiMgMnMoNaNbNiP
content1.01.01.00.050.10.10.15.00.1750.251.0
elementPbSSiSnThTiVWZnZrYU
content1.00.20.20.10.01.00.270.01.00.21.00.005



ppm of non-metallic impurities

element

CHON
content10015150100



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