Tungsten titanium (WTi) alloy target

Product category refractory alloy target

Tungsten Titanium (WTi) alloy target material

Element symbol W+Ti

Purity: 3N5, 4N

Shape plane target customization

Tungsten-titanium alloy targets are produced by powder metallurgy technology and are widely used in semiconductor and thin-film solar cells.

For semiconductor applications, the WTi10wt % film is used as a diffusion barrier and adhesive layer to separate the metallized layer from the semiconductor, for example, separating aluminum from silicon, or copper from silicon. Thus, the function of semiconductors in microchips can be significantly improved.

For thin-film solar cells, the WTi10wt % film is also used as a barrier to prevent the diffusion of iron atoms in the steel substrate to molybdenum back contacts and CIGS semiconductors. Tungsten-titanium alloy targets are also used in LED and tool coatings.

Our factory can produce WTi 90/10wt %, WTi 85/15wt % target, and can be customized special composition target, actual target density > 99%, average grain size < 100um. With up to 4N5 purity and special annealing treatment, uniform grain size, and low gas content, end users can obtain constant corrosion rates and high purity and uniform film coatings during the PVD process.

Tungsten products: tungsten plate, tungsten slab, tungsten wire, tungsten strip, tungsten rod, tungsten parts, tungsten fasteners, tungsten electrode, tungsten boat, tungsten crucible, tungsten circle, tungsten foil, tungsten sheet, tungsten target, tungsten target, tungsten rope, tungsten copper alloy, tungsten nickel iron, tungsten nickel copper and other tungsten molybdenum special products