Customized High-purity Titanium Block Vacuum Titanium Material/Multi-arc Ion Plating Material Metal Target
Characteristic
Technique | Forging ,Machining | ||||||
Status | Annealed | ||||||
Type | Round target | ||||||
Surface | CNC lathe surface | ||||||
Certificate | SO9001:2015, TUV, SGS ,EN10204.3.1 | ||||||
Application | 1. Medical:titanium alloy (Ti6Al4V-ELI F136) and cp titanium (Ti Gr.2 F67) for implants 2. Used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications |
Specifications:
Specifications | Chromium | Chrome aluminum | Titanium | Titanium aluminum |
Content | 99.99% | 99.99% | 99.99% | 99.99% |
Density | 7.19cm3/g | customized | 4.5cm3/g | customized |
Average particle size | ≤50μm | ≤50μm | ≤50μm | ≤50μm |
Shape (Max or Minimum) | Customized | customized | customized | customized |
Sintering technology | Hot isostatic pressure | hot isostatic pressure | hot isostatic pressure | hot isostatic pressure |
Oxygen content | ≤150ppm | ≤150ppm | ≤100ppm | ≤100ppm |
We provide target materials in this type:
Cylindrical Sputtering Target Material | Arc Target Material Discs |
Titaninum | Titaninum |
- | TiAlSi |
- | TiAl |
- | Graphite |
Silicon (3mm thickness for the silicon, with stainless steel core) | - |
- | CrAl |
- | Zirconium |
Chrome | Chrome |
Aluminum | Aluminum |
- | AlCrSi |