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Tantalum (Ta) targets

Tantalum (Ta) targets

Product category high purity metal target

Tantalum (Ta) target material

Element symbol Ta

Purity: 3N5, 4N

Shape plane target rotating target customization


More Info

Product category high purity metal target

Tantalum (Ta) target material

Element symbol Ta

Purity: 3N5, 4N

Shape plane target rotating target customization

Overview of tantalum (Ta) targets

Tantalum target material, tantalum chemical symbol Ta, steel gray metal, belonging to Group VB in the periodic table, atomic number 73, atomic weight 180.9479, body centered cubic crystal, common valence +5. Tantalum has a low hardness, and is related to oxygen content, ordinary pure tantalum, annealed Vickers hardness is only 140HV. Its melting point is as high as 2995℃, which ranks fifth among the simple substances, next to carbon, tungsten, rhenium and osmium. Tantalum is malleable and can be drawn into thin filaments. Its coefficient of thermal expansion is very small. It expands by only 6.6 parts per million for every degree Celsius rise. In addition, it is very tough, better than copper. High purity tantalum can be used as solid electrolytic capacitors with large capacity, small size and stable performance for radar, missiles, supersonic aircraft and electronic computers. Tantalum can also be used in the manufacture of petrochemical heat exchangers, heaters, concentrators and reactor tanks, towers, pipes and valves. Tantalum can also be used as a material for electronic transmitting tubes and high-power electron tubes. Tantalum alloy can be used as a combustion chamber and heat-resistant high-strength material for supersonic aircraft. Tantalum carbide can be used as a coating for missile nozzles. Tantalum carbide is widely used in the manufacture of hard metals. Tantalum also has the stability and healing properties with human tissue, and can be used as surgical complement material and artificial bone, as well as bone plates, screws and suture needles. The following figure shows the image of microscopic metallographic detection of tantalum sputtering target, with average particle size < 100um


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