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Tantalum rods High density tantalum rods for 99.95% semiconductors

Tantalum rods High density tantalum rods for 99.95% semiconductors

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Tantalum rods High density tantalum rods for 99.95% semiconductors


Tantalum target preparation process flow:
Material preparation - melting - chemical analysis - forging - rolling - annealing - metallographic testing - machining - dimensional testing - Cleaning - final inspection - packaging
Application of zinc sputtering target:

Tantalum sputtering materials can be used for thin film coating, CD-ROM, decoration, flat panel display, functional coating, and other optical information storage space industries, glass coating industries such as automotive glass and architectural glass, optical communication, etc.


Material

99.95% pure tantalum

Grade

 R05200, R05400, R05252, R05255, R05240

Standard

ASTM B365  F136

Shape

rod, bar, round/square

Size

Dia 1.0mm min. x L

Application

Industrial, Electronic, Medical

Packaging

Standard export plywood case 

Mechnical properties

Grade(UNS)

Annealed

Tensile strength min, psi (MPa)

Yield strength min,

psi (MPa)

Elongation min,%

 

Pure Ta (RO5200)

25000 

15000 

25

Ta-10W  (RO5255)

70000 

55000 

20

Ta-2.5W (RO5252)

40000 

28000 

20

Ta-40Nb (RO5240)

35000 

15000 

25

 

 

Related equipment

ASTM B365 9995 pure tantalum bar price per kg

Packaging & Shipping

ASTM B365 99.95% pure tantalum bar price per


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