(1)100 % density = 4.51 g/cm³
(2)Dimensional stability
(3)Enhanced mechanical properties
(4)Uniform grain size distribution
(5)Small grain sizes
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factory directly sale 4N (99.99%) purity HIP method Ti target Titanium sputtering target
More Info
Product Descr1ption
Round type 4N purity Titanium target
Size: dia 128mm and 15mm thickness
Popular standard size or OEM machining
Smooth edge
Well machined with smmoth edge.
Laser marking
Laser marking to track the all process during producing.
Clear thread
All thread are clear and precise.
Advantage：
(2) Grinding or lathing edge, no cutting marks
(1) Smooth surface without pore,scratch and other imperfection
(2) Grinding or lathing edge, no cutting marks
(3) Unbeatable lerel of material purity
(4) High ductility
(5) Homogeneous micro trucalture
(6) Laser marking for your special Item with name, brand, purity size and so on
(7)Every pcs of sputtering targets from the powder materials item&number, mixing workers,outgas and HIP time,machining person and packing details are all made ourselves.
All of those step can promise you once a new sputtering target or method is created ,it could be copied and kept to support a stabel quality products.
Other dvantage:
high quality materials
(1)100 % density = 4.51 g/cm³
(2)Dimensional stability
(3)Enhanced mechanical properties
(4)Uniform grain size distribution
(5)Small grain sizes
(1)100 % density = 4.51 g/cm³
(2)Dimensional stability
(3)Enhanced mechanical properties
(4)Uniform grain size distribution
(5)Small grain sizes